Helping to take your idea from design, through CAD, into prototype, and onto production. Rapid turn around with affordable rates for academic and industrial clients. 
Protection of Intellectual Property

IRL respects your hard work and development that you and your team have invested in to your IP. To that end we work to protect you intellectual property and trade secrets. For an extra peace of mind both parties can sign a nondisclosure agreement. The facility staff members and tool process mangers at the facilities utilized are also bound by contracts not to discuss and disclose protected information. 

Design of Experiment 

IRL can be consulted to help with experimental design and implementation in many fields. Assistance can be provided to build a full D.O.E. and estimate what will be required to complete the experiment or to help design tooling and fixtures. If needed IRL can build the required parts to make your project succeed. If you have an idea and have been struggling to make it a reality; contact IRL help bringing it all together. 

Process Design and Optimization 

Whether you have fabrication experience or not, I will help you quickly develop and optimize your process flow for either lower cost or product yield. With flexible process options and access to multiple world class facilities your devices are sure to succeed. Custom development of process suited to your application. Leveraging access to multiple facilities ensures the right tooling for the job. If necessary a robust design of experiment protocol will be utilized to expedite the process development. 

Access to other Facilities

With local access to the resources of Cornell University and the world class research centers located on campus there is a wealth of local knowledge that can be utilized to help ensure the success of your project. With an eye towards intellectual property protection; most of these experts are bound by non-disclosure contracts to help ensure the security of your developed ideas. When needed IRL can leverage the network power of the National Nanotechnology Coordinated Infrastructure (NNCI) to access other fabrication facilities.

The core facilities located on Cornell's campus that IRL accesses are:


The rapidly expanding facility located at the University of Pennsylvania is the QNF.


IRL has experience developing solutions to difficult high aspect ratio etching problems in silicon, dielectrics and metals. Access to a wide range of tooling and unique gas chemistry along wide process latitude ensures that the etching meets or exceeds the project specifications. Batch processing of wafers utilizing wet chemistry is available to increase throughput and reduce cost. 


The crucial step at the end of all of the processing that can make or break a project. Precision dicing and singulation of the devices utilizing a Dicso dicing saw in conjunction with the application appropriate cutting wheel. I have experience dicing through optical facets and have processes developed that help to minimize the polishing required to get light in and out of your delicate devices. 


With extensive experience from cost effective contact lithography to e-beam written patterns IRL can deliver on your needs. Upon consultation the requirements and dimensionality of your work will dictate what type of exposure tool will be required. Laser writing and wet etching of photo-masks can be accomplished with about 3 hours at the CNF. 


Let IRL develop the precision metal film that will help your device succeed. From improving the performance and reproducibility of RTD circuits to optimizing optical properties we can quickly and accurate develop a solution to your metal needs. Wide processes latitude and a large selection of available metals ensures the required flexibility to meet exacting design specifications. Robust post-deposition processing of the metal film to pattern using lift off, ion beam milling, and dry etching are available. Precision anneal processes help ensure the proper performance of active electronic contacts. 

Atomic Force Microscopy


The ability to analyze surfaces and structures to within a few angstroms is often necessary during processing. Access to a high performance AFM allows the measurement of RMS surface roughness, etch profile roughness, and very precise determination of dimensions. 

SU-8 Structures and Microfluidics 

SU-8 is a robust negative tone epoxy type of resist. It can be utilized to make a wide range of very durable, high aspect ratio devices with wide ranging applications including microfluidics and biomedical devices.

Thin Film Deposition and Metrology 

With years of experience with deposited films IRL can help to develop the thin film that your application requires. IRL has extensive experience with PECVD, LPCVD and grown dielectric films. Accurate measurement of thickness and the index of refraction of dielectric films using ellipsometry, prism coupling or reflection techniques can be achieved with the tools readily available. 

SEM Imaging and Energy-Dispersive X-Ray Spectroscopy

Scanning electron microscopy is a crucial tool during the fabrication process to determine and document critical dimensions of features. Survey images can be captured at several points along the process flow to ensure adherence to specified dimensions and to help understand the behavior of the final device. The EDS spectra of materials can also verify the composition of the metals or other deposited films. This is especially helpful in the diagnosis of contaminates in process materials or devices. 

© 2016 by Ithaca Research Lab L.L.C.